NanoFrazor Direct Laser Sublimation (DLS) Extension

The standard NanoFrazor resist – PPA can also be patterned directly using a focused laser. The Direct Laser Sublimation (DLS) NanoFrazor extension enables this capability and can be integrated in the NanoFrazor Explore.

The DLS option enables fast patterning of large features (> 500 nm resolution) in the same resist layer that is nanostructured by the heated NanoFrazor tip (< 500 nm resolution). Consequently, the total fabrication time for devices that require both large and small patterns (e.g. electric contacts) is reduced dramatically.

 Very accurate alignment between the written micro- and nanometer features is achieved using the integrated NanoFrazor topography imaging and overlay capability. Autofocus of the laser is possible using the distance sensor of the NanoFrazor cantilevers. This mechanism for autofocus works even on non-standard samples that usually cause difficulties using conventional laser reflection or airflow autofocus mechanisms.

 

The DLS add-on option currently exists as a prototype. Pre-orders for the commercial DLS writer can already be placed. Please contact us for further information.

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