WITec alpha300 Ri – Inverted Confocal Raman Imaging

alpha300Ri

Experience Raman Imaging from a new angle.

The alpha300 Ri turns 3D chemical characterization upside down. Its inverted beam path preserves all the functionality of WITec’s standard alpha300 confocal Raman imaging microscopes while introducing a new angle in access and handling. The ability to view and investigate samples from below is a great advantage when working with aqueous solutions and oversized samples. Studies in life sciences, biomedicine and geosciences in particular will benefit from the consistency and flexibility provided by the geometry of the alpha300 Ri.


READ MORE: WITec alpha300 Ri – INVERTED CONFOCAL RAMAN IMAGING

NanoFrazor Direct Laser Sublimation (DLS) Extension

The standard NanoFrazor resist – PPA can also be patterned directly using a focused laser. The Direct Laser Sublimation (DLS) NanoFrazor extension enables this capability and can be integrated in the NanoFrazor Explore.

The DLS option enables fast patterning of large features (> 500 nm resolution) in the same resist layer that is nanostructured by the heated NanoFrazor tip (< 500 nm resolution). Consequently, the total fabrication time for devices that require both large and small patterns (e.g. electric contacts) is reduced dramatically.

 Very accurate alignment between the written micro- and nanometer features is achieved using the integrated NanoFrazor topography imaging and overlay capability. Autofocus of the laser is possible using the distance sensor of the NanoFrazor cantilevers. This mechanism for autofocus works even on non-standard samples that usually cause difficulties using conventional laser reflection or airflow autofocus mechanisms.

 

The DLS add-on option currently exists as a prototype. Pre-orders for the commercial DLS writer can already be placed. Please contact us for further information.

Asylum Research Announces the New Cypher VRS Video-Rate AFM

The Cypher VRS AFM is the first and only full-featured video-rate AFM. Finally, researchers can measure nanoscale dynamic processes at video-rate speeds with all of the resolution, versatility, and ease of use that are the hallmarks of an Asylum Research Cypher™ AFM.Cypher VRS Scanner

High resolution video-rate imaging at up to 625 lines per second
Exceptional ease of use — even at 10 frames per second
Full range of modes and accessories — unlimited capabilities at normal scan speeds

Cypher VRS is faster, much faster

The Cypher VRS speed is 300× faster than normal AFMs and at least 10× faster than current “fast scanning” AFMs.

More than video-rate AFM
The Cypher VRS has unlimited capabilities when imaging at normal speeds. It performs all the same modes as our Cypher ES AFM and is compatible with the complete range of environmental accessories. Existing Cypher S and Cypher ES AFMs can be upgraded to the Cypher VRS.

Read more: Asylum Research Announces the New Cypher VRS Video-Rate AFM

3-D Printing with in situ Microscopy

In a world where 3-D printing and nanotechnology are becoming commonplace, Dr. Ray Unocic has discovered a way to do both simultaneously.

 In a recent paper in Nanoscale, Dr. Unocic and colleagues from Oak Ridge National Lab outline a technique and preliminary results for a completely new type of material printing process. Using an aberration-corrected Scanning Transmission Electron Microscope (STEM), fitted with a Protochips Poseidon Select liquid cell, they were able to turn the electron beam into a sub angstrom, palladium-writing nanoparticle generator. This was possible by filling the liquid cell with an H2PdCl4 solution that reduces under the electron beam to form Pd nanoparticles in a process called “radiolysis”. By adjusting the electron beam position, dwell time and spot size, Dr. Unocic was able to draw shapes, letters, and even entire words into the liquid cell. With the electron beam being smaller than a single atom, this technique could allow scientists to 3-D print objects on an unprecedented tiny scale.

READ MORE: 3-D PRINTING WITH IN SITU MICROSCOPY